FILM SPECIFICATIONS
CHROME: Vacuum Deposited, DC Sputtered in Class 100 Environment
THICKNESS/OPTICAL DENSITY: Standard: 1600Å /O.D.=4.0 ± 0.3 @ 530mm.
Custom Thicknesses up to 5 µ m
REFLECTIVITY:
| Low Reflective - LRC |
8% @ 450nm
|
| Mid Reflective - MRC |
33% @ 450nm |
| High Reflective - HRC |
>48% @ 450nm |
| Blue - R632 |
<5% @ 632nm |
| Blue/Chrome/Blue - R632/632 |
<5% @ 632nm Both Sides |
| Green - R850 |
<5% @ 850nm |
| Green/Chrome/Green - R850/850 |
<5% @ 850nm Both Sides |
CLICK HERE for Chrome Reflectivity Graph
PROCESS: Etchable in all conventional Wet Etch systems
Plasma Grade recommended for Dry Etch systems
PHOTORESIST:
5300Å AZ 1500 filtered to 0.045 microns at point of use. Fringless and Regular Spin Available.
Custom Photoresist options include all widely used positive and negative optical and E-beam resist available.
Including: AZ MIR701, AZ P4600, AZ 5206, AZ 9260, AZ nLOF 2000, AZ 6615, AZ ECI3027
S1800, HR200, IP3500, IP3600, PMMA, AR N7700, SU-8, LOR A, LOR B, PMGI
